Leveraging nearly three decades of global application experience, ABB Ltd continues to provide advanced high-sensitivity gas analysis solutions that support semiconductor manufacturers worldwide in achieving higher precision, safety, and production efficiency.

ABB was among the early adopters of Fourier Transform Near-Infrared (FT-NIR) spectroscopic process analyzers for wet process control in semiconductor manufacturing. These solutions help equipment manufacturers extend bath lifetime while minimizing contamination risks and maintaining stable process performance.

In recent years, ABB has further expanded its semiconductor portfolio by introducing analyzers based on Off-Axis Integrated Cavity Output Spectroscopy (OA-ICOS) technology. These solutions address a critical industry need: monitoring trace-level gaseous contaminants in cleanroom environments to ensure operator safety and prevent costly wafer loss.

According to Zhang Naizheng, Global Product Manager for the Semiconductor Industry at ABB Measurement & Analytics, hundreds of ABB systems have been installed over the past decade across China, South Korea, Japan, and other key semiconductor manufacturing regions. He emphasized that semiconductor production requires both ultra-sensitive airborne molecular contamination (AMC) monitoring and precise wet process control to improve yield and reduce wafer damage risk, making ABB’s high-sensitivity technologies essential.

Based on OA-ICOS technology, the GLA231 series enables real-time, highly accurate measurement of hydrogen fluoride, hydrogen chloride, and ammonia—three critical high-purity gases widely used in etching, cleaning, and deposition processes. Compared with conventional spectroscopic methods, OA-ICOS technology offers improved durability, faster measurement cycles, and simplified field maintenance.

ABB gas analyzers have long supported leading global semiconductor manufacturers by enabling detection of extremely low-concentration chemical substances in cleanroom environments, helping ensure production stability and safety.

The company also provides a wide range of wet process monitoring solutions for semiconductor equipment manufacturers, including the proven FTPA2000-SC series, TALYS ASP300 series, and TALYS ADP300 series. Among them, the TALYS ASP300 series represents ABB’s next-generation process analyzer for the semiconductor industry, featuring broadband infrared spectroscopy technology.

This system is designed for real-time monitoring of wet etching, cleaning, and photoresist stripping baths, continuously tracking chemical concentrations. When abnormal changes are detected, the system immediately triggers alarms, enabling rapid corrective action.

Such real-time monitoring capabilities help reduce wafer damage risk, maintain consistent production quality, extend chemical bath lifetime, and reduce overall chemical consumption while minimizing process deviations.

In addition, the TALYS ADP300 series delivers cost-effective, high-performance dual-channel wet bath monitoring, enabling simultaneous dual-stream measurement and improved analytical efficiency for key process control applications.

Through its integration of engineering expertise and digital technologies, ABB continues to support more sustainable and efficient industrial development. With over 140 years of history and approximately 110,000 employees worldwide, ABB is listed on the Swiss Exchange and Nasdaq Stockholm.